Localization and Normalization of Isolated Direct Contour Lines Based On Masks and Form-Factor

Authors

  • Oday J. Al-Furaiji Computer Technologies Engineering, Kinouze University College, Basra, Iraq
  • Aksana G. Shauchuk Department of networks and devices BSUIR, Belarusian state University of Informatics and Radioelectronics ,Minsk, Belarus,Ukraine
  • Viktar Yu. Tsviatkou Department of networks and devices BSUIR, Belarusian state University of Informatics and Radioelectronics ,Minsk, Belarus,Ukraine

DOI:

https://doi.org/10.31663/utjes.v6i3.591

Keywords:

allocation of direct lines, contour image processing, key elements, identification, parameterization

Abstract

The method for localization of isolated direct contour lines based on form-factor is proposed in this paper. The essence of this method consists in comparison to unit of value of form-factor –the relations of the size of the contour line (distance between end points) to its length (number of the forming contour pixels). It is found that the proposed method provides a gain in speed of allocating direct contour lines in 4 times in comparison with the method of LSD (Line Segment Detector) and in 14.8 times in comparison with the method based on the Hough transform.The effective method of normalization of the contour line on thickness on the basis of the analysis of orientation of the connected pixels is proposed in this paper. This method is specially developed for deleting excess pixels of a dedicated line.Also developed algorithm of normalization of contour lines on thickness promotes the best calculation of a form-factor.

Downloads

Published

2015-12-01

Issue

Section

Articles

How to Cite

Localization and Normalization of Isolated Direct Contour Lines Based On Masks and Form-Factor. (2015). University of Thi-Qar Journal for Engineering Sciences, 6(3), 1-18. https://doi.org/10.31663/utjes.v6i3.591